MEMS / Nano Fabrication Tools
Specialized High Performance Wafer Processing Platforms
Fully reestored Semitool Wet Processing Tools. Comprehensive Service and After Sales Support
Semitool Spray Acid Tool • Cleaning, Etching, HF Vapor Release
Compact (24" wide) Programable System Supports a Wide Range of Acid Based Chemistries Ideal for critical cleans, metal etch, oxide etch, and FEOL photoresist removal. Applications include wafer cleaning, etching metals and oxides, stripping photoresist and polymer removal.
Semitool Spray Solvent Tool • Photoresist Removal
Heated Chemistries
Fast Precise Stripping
Wide Range of Applications
The Semitool Spray Solvent Tool applies heated stripping and rinse chemistries for stripping a wide range of photoresists and residual polymers.
Semitool Spin Rinser Dryer
Wafer Cleaning, Rinsing, Drying
Anywhere wet processing is done, Semitool SRDs provide a highly reliable solution for rinsing and drying.
Small Footprint
Low DI Usage.